Recently, CETC Fenghua Information Equipment Co., Ltd. launched the first third-generation semiconductor wafer defect detection equipment with completely independent intellectual property rights—Mars 4410. At present, the equipment has been sent to many domestic customers for use.

Mars 4410 is the key equipment in the silicon carbide device production line, used for defect detection of silicon carbide substrate wafers, epitaxial wafers, and corrosion wafers. After two years of unremitting efforts, the design team has overcome the core key technologies of optical detection such as laser scattering and microscopic imaging.

The equipment adopts various detection methods such as differential interference phase contrast, photoluminescence, dark field, etc. Wafer detection can be processed in parallel with data analysis, and wafer defects can be correlated with device failure, with low noise and high resolution imaging , high detection throughput, high detection rate and accuracy, etc., can meet the demand for improving the yield of SiC devices.

Under the support and guidance of national, provincial and municipal industrial policies, CETC Fenghua has accelerated technological research and launched silicon carbide defect detection equipment to fill the domestic gap, break international monopoly, realize import substitution, and actively respond to my country's third-generation semiconductor industry The urgent need for development has solved the "stuck neck" technical problem. China Electronics Technology Fenghua Company will continue to devote itself to the independent and localized construction of the industrial chain, and escort the independent controllable and high-quality development of my country's third-generation semiconductor industry!